Study on Synchrotron Radiation Lithography at BSRF

PENG Liang-Qiang; YI Fu-Ting; HAN Yong; ZHANG Ju-Fang

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《中国物理C》（英文）编辑部

2024年10月30日

Chinese Physics C> 2001, Vol. 25> Issue(S1) : 128-130

Study on Synchrotron Radiation Lithography at BSRF

Institute of High Energy Physics,CAS,Beijing 100039,China

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Abstract：
It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.

References

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PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130.

PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130. shu

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Received: 1900-01-01
Revised: 1900-01-01

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1.
沈阳化工大学材料科学与工程学院沈阳 110142

Study on Synchrotron Radiation Lithography at BSRF

Corresponding author: PENG Liang-Qiang,

Institute of High Energy Physics,CAS,Beijing 100039,China

Received Date: 1900-01-01
Accepted Date: 1900-01-01
Available Online: 2001-06-22

Abstract: It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.