Hard X-ray one dimensional nano-focusing at the SSRF using a WSi<SUB>2</SUB>/Si multilayer Laue lens

HUANG Qiu-Shi; LI Hao-Chuan; SONG Zhu-Qing; ZHU Jing-Tao; WANG Zhan-Shan; LI Ai-Guo; YAN Shuai; MAO Cheng-Wen; WANG Hua; YAN Fen; ZHANG Ling; YU Xiao-Han; LIU Peng; LI Ming

doi:10.1088/1674-1137/37/2/028002

Chinese Physics C> 2013, Vol. 37> Issue(2) : 028002 DOI: 10.1088/1674-1137/37/2/028002

Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens

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The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μ. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.

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HUANG Qiu-Shi, LI Hao-Chuan, SONG Zhu-Qing, ZHU Jing-Tao, WANG Zhan-Shan, LI Ai-Guo, YAN Shuai, MAO Cheng-Wen, WANG Hua, YAN Fen, ZHANG Ling, YU Xiao-Han, LIU Peng and LI Ming. Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens[J]. Chinese Physics C, 2013, 37(2): 028002. doi: 10.1088/1674-1137/37/2/028002

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Received: 2012-03-20
Revised: 2012-05-08

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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens

Corresponding author: ZHU Jing-Tao,

Received Date: 2012-03-20

Accepted Date: 2012-05-08

Available Online: 2013-02-05

Abstract: The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μ. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.

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Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens

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Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens

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Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens

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Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens

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Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens

Hard X-ray one dimensional nano-focusing at the SSRF using a WSi₂/Si multilayer Laue lens