A 14.5GHz New ECR Ion Source With High Charge State and High Magnetic Field

Zhao Hongwei; Liu Zhanwen; Zhang Xuezhen; Guo Xiaohong; Gao Jiyuan; Zhang Zimin; Yuan Ping; Zhang Wen; Lei Hailiang; Cao Yun; Feng Yucheng; Li Jinyu; Wang Hui; Ma Baohua; Wang Yifang; Wei Baowen

Chinese Physics C> 1999, Vol. 23> Issue(7) : 717-722

A 14.5GHz New ECR Ion Source With High Charge State and High Magnetic Field

Institute of Modern Physics, The Chinese Academy of Sciences, Lanzhou 730000

Abstract
HTML
Reference
Related

PDF

Abstract：
A 14.5 GHz ECR (Electron Cyclotron Resonance) ion source with high charge stato and high magnetic field was designed and built. The structure characteristics, optimization design of parameters and magnetic field distribution are described, and the commissioning results are given. The maximum axial magnetic field on the axis is 1.5 Tesla. The hexapole field on the chamber surface is 1.0 Tesla. After initial commissioning, the ion source can produce typically 0⁷+140 eA, Ar¹¹+185eA and Xe²⁶⁺ 50 eA. The results from this new ion source are compared with the best ECR ion sources over the world in 1998.

References

[1]

Liu Zhanwen, Zhang Wen, Zhao Hongwei et al. Rev. Sci. Instrum., 1998, 69(2): 685–687 2 Hitz D. Rev. Sci. Instrum, 1996, 67(2):1280–12833 Nakagawa T, Arje J, Miyazawa Y et al. Rev. Sci. Instrum., 1998, 69(2):637–639 4 Xie Z Q. Rev. Sci. Instrum., 1998, 69(2):625–6295 Ludwig P, Bourg F, Briand P et al. Rev. Sci. Instrum., 1998, 69(2):653–655

Access

Get Citation

Zhao Hongwei, Liu Zhanwen, Zhang Xuezhen, Guo Xiaohong, Gao Jiyuan, Zhang Zimin, Yuan Ping, Zhang Wen, Lei Hailiang, Cao Yun, Feng Yucheng, Li Jinyu, Wang Hui, Ma Baohua, Wang Yifang and Wei Baowen. A 14.5GHz New ECR Ion Source With High Charge State and High Magnetic Field[J]. Chinese Physics C, 1999, 23(7): 717-722.

RIS(for EndNote,Reference Manager,ProCite)

BibTex

Txt

Milestone

Received: 1998-10-05
Revised: 1900-01-01

Article Metric

Article Views(4098)
PDF Downloads(583)
Cited by(0)

Policy on re-use

To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.

通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142