Study on Synchrotron Radiation Lithography at BSRF

PENG Liang-Qiang; YI Fu-Ting; HAN Yong; ZHANG Ju-Fang

Chinese Physics C> 2001, Vol. 25> Issue(S1) : 128-130

Study on Synchrotron Radiation Lithography at BSRF

Institute of High Energy Physics,CAS,Beijing 100039,China

Abstract
HTML
Reference
Related

PDF

Abstract：
It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.

References

[1]

Griffiths S K, Hruby J M, Ting T. J. Micromech.Microeng., 1999, 9:3532 Guckel H, Christenson T R, Klein J et al. Proc. 7th Int. Symp. On Microsystems, Intelligent Materials and Robots, 1996, p213 CHENG Y, Shew B Y, Lin C Y et al. J. Micromech. Microeng, 1999, 9:584 YI F, JIN M, TANG E et al. Microsystem Technologies, 1996, 3:75 PENG Liang-Qiang, YI Fu-Ting, ZHANG )u-Fang et al. Micro/Nano Science and Technology, 2000, 5:51 (in Chinese)(彭良强，伊福廷，张菊芳等.微米/纳米科学与技术, 2000,5:51)

Access

Get Citation

PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130.

PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130. shu

RIS(for EndNote,Reference Manager,ProCite)

BibTex

Txt

Milestone

Received: 1900-01-01
Revised: 1900-01-01

Article Metric

Article Views(3706)
PDF Downloads(467)
Cited by(0)

Policy on re-use

To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.

通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

Study on Synchrotron Radiation Lithography at BSRF

Corresponding author: PENG Liang-Qiang,

Institute of High Energy Physics,CAS,Beijing 100039,China

Received Date: 1900-01-01
Accepted Date: 1900-01-01
Available Online: 2001-06-22

Abstract: It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.