Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers
- Received Date: 2005-10-28
- Accepted Date: 1900-01-01
- Available Online: 2005-01-02
Abstract: Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films.





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