A SMALL-SIZE ARC-DISCHARGE ION-SOURCE

BAI Gui-Bin

Chinese Physics C> 1987, Vol. 11> Issue(2) : 245-249

A SMALL-SIZE ARC-DISCHARGE ION-SOURCE

BAI Gui-Bin ^,

Institute of Low Energy Nuclear Physics Beijing Normal University

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Abstract：
The article describes a small-size are discharge ion source. Some of its basic parameters are measured by combining the are discharge with the electron oscillation. The ion current is 7mA. It can produce multi-charge ions. The extraction structure is commonly used by this source and the r.f. ion source. This ion source has been used in a 400keV ion implanter in Beijing Normal University and it is stable in operation.

References

[1]	Meyrand R. C., Brown S: C.,Rev. Scient. lnstrum., 30(1959), 110.[2] Ma Mingxiu, Iao Wei, Bai Guibin, Zhang Tungxo, Radiation effects, 44(1979), 207.

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BAI Gui-Bin. A SMALL-SIZE ARC-DISCHARGE ION-SOURCE[J]. Chinese Physics C, 1987, 11(2): 245-249.

BAI Gui-Bin. A SMALL-SIZE ARC-DISCHARGE ION-SOURCE[J]. Chinese Physics C, 1987, 11(2): 245-249. shu

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Received: 1900-01-01
Revised: 1900-01-01

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沈阳化工大学材料科学与工程学院沈阳 110142

A SMALL-SIZE ARC-DISCHARGE ION-SOURCE

BAI Gui-Bin ^,

Corresponding author: BAI Gui-Bin,

Institute of Low Energy Nuclear Physics Beijing Normal University

Received Date: 1900-01-01
Accepted Date: 1900-01-01
Available Online: 1987-04-05

Abstract: The article describes a small-size are discharge ion source. Some of its basic parameters are measured by combining the are discharge with the electron oscillation. The ion current is 7mA. It can produce multi-charge ions. The extraction structure is commonly used by this source and the r.f. ion source. This ion source has been used in a 400keV ion implanter in Beijing Normal University and it is stable in operation.