Monte Carlo Simulation of High-energy Electron Beam Exposure in Resist

SONG Ying-Hui; ZHANG Yu-Lin; WEI Qiang; KONG Xiang-Dong

Chinese Physics C> 2005, Vol. 29> Issue(12) : 1219-1224

Monte Carlo Simulation of High-energy Electron Beam Exposure in Resist

Institute of Electron Beam,Shandong University,Ji'nan 250061,China

Abstract
HTML
Reference
Related

PDF

Abstract：
The complex scattering process of the high-energy(50keV≤E₀≤100keV) electron beams with the Gaussian distribution in resist is simulated by Monte Carlo method with different energy range models. The backscatter coefficient of electrons and energy deposition distributions are presented under different exposure conditions. The simulation results are in good agreement with the experimental data. It is found that, in the energy range 50keV≤E₀≤100keV, higher electron beam energy, thinner resist and lower substrate's atom number will cause lower proximity effect, which agrees with the corresponding experiment. The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.

References

[1]

. REN Li-Ming. Study on Monte Carlo Simulation of Elec-tron Beamm Lithography and Proximity Effect Correc-tion Technique. Doctoral Thesis. Center of Microelectron-ics, The Chinese Academy of Science, 2002(in Chinese)(任黎明.电子束曝光的Monte Carlo模拟及邻近效应校正技术研究.博士论文.中国科学院微电子中心，2002)2. REN Li-Ming, CHEN Bao-Qin. Chinese Journal of Semi-conductors, 2001, 22(12): 1519(in Chinese)(任黎明，陈宝钦.半导体学报，2001, 22(12): 1519)3. TAN Zhen-Yu, He Yan-Cai. Chinese Journal of Computa-tional Physics, 2000, 17(3): 331-336(in Chinese)(谭震宇，何延才，计算物理，2000, 17(3): 331-336)4. Kenji Murata, David F Kyser, Chiu H. Ting. J. Appl.Phys., 1981, 52(7): 43965. Ivin V V, Silakov M V, Babushkin G A et al. Micro-electeonic Engineering, 2003, 69: 5946. Pandey L N, Rustgi M L. J. Appl. Phys., 1989, 66(12):60597. LIU Ming, CHEN Bao-Qin, ZHANG Jian-Hong et al. Mi-crofabrication Technology, 2000 (1): 16(in Chinese)(刘明，陈宝钦，张建宏等.微细加上技术，2000 (1): 16)8. Chang T H P. J. Vac. Sci. Technol, 1975, 12(6): 12719. Murata K, Kawata H, Nagami K et al. J. Vac. Sci. Technol.,1987, B5(1): 12410. Adesida, Shimizu R, Everhart T E. J. Appl. Phys., 1980,51(11): 506211. Joy D C, Lou S. Scanning, 1989, 11(4): 17612. REN Li-Ming, CHEN Bao-Qin. Microfabrication Technol-ogy, 2001 (3): 60(in Chinese)(任黎明，陈宝钦.微细加上技术，2001 (3): 60)13. REN Li-Ming, CHEN Bao-Qin, TAN Zhen-Yu et al. Opto-Electronic Engineering, 2002, 29(3): 24(in Chinese)(任黎明，陈宝钦，谭震宇等.光电工程，2002, 29(3): 24)14. Reimer L, Krefting E R. National Bureau of Standards Spe-cial Publication, 1976, 460: 45

[1]	Qi-Nan Wang , Zhu-Feng Zhang , T. G. Steele , Hong-Ying Jin , Zhuo-Ran Huang . A comprehensive revisit of the ρ meson with improved Monte-Carlo based QCD sum rules. Chinese Physics C, 2017, 41(7): 074107. doi: 10.1088/1674-1137/41/7/074107
[2]	Kai Xi , Chao Geng , Zhan-Gang Zhang , Ming-Dong Hou , You-Mei Sun , Jie Luo , Tian-Qi Liu , Bin Wang , Bing Ye , Ya-Nan Yin , Jie Liu . Monte Carlo predictions of proton SEE cross-sections from heavy ion test data. Chinese Physics C, 2016, 40(6): 066001. doi: 10.1088/1674-1137/40/6/066001
[3]	WANG Wen , CHENG Meng-Yun , LONG Peng-Cheng , HU Li-Qin . Specific absorbed fractions of electrons and photons forRad-HUMAN phantom using Monte Carlo method. Chinese Physics C, 2015, 39(7): 078203. doi: 10.1088/1674-1137/39/7/078203
[4]	DENG Jun , CAO Lei , SU Xu . Monte Carlo simulation of indoor external exposure due to gamma-emitting radionuclides in building materials. Chinese Physics C, 2014, 38(10): 108202. doi: 10.1088/1674-1137/38/10/108202
[5]	YAN Wei-Hua , ZHANG Li-Guo , ZHANG Yan , ZHANG Zhao , XIAO Zhi-Gang . Monte Carlo studies on the burnup measurement for the high temperature gas cooling reactor. Chinese Physics C, 2013, 37(11): 116201. doi: 10.1088/1674-1137/37/11/116201
[6]	TANG Xiao , ZHAO Wei , WANG Yan-Fang , SHU Hang , SUN Cui-Li , WEI Cun-Feng , CAO Da-Quan , QUE Jie-Min , SHI Rong-Jian , WEI Long . Monte Carlo simulation of glandular dose in a dedicated breast CT system. Chinese Physics C, 2012, 36(7): 675-680. doi: 10.1088/1674-1137/36/7/019
[7]	WANG Yi , LI Qin , JIANG Xiao-Guo . Monte Carlo simulations for 20 MV X-ray spectrum reconstruction of a linear induction accelerator. Chinese Physics C, 2012, 36(9): 861-866. doi: 10.1088/1674-1137/36/9/012
[8]	REN Zhong-Zhou , LIN Qi-Hu , . Diffusion Monte Carlo calculations ofthree-body systems. Chinese Physics C, 2012, 36(11): 1065-1068. doi: 10.1088/1674-1137/36/11/005
[9]	WANG Zhi-Gang , HE Kang-Lin , AN Zheng-Hua , CAI Xiao , DONG Ming-Yi , FANG Jian , HU Tao , LIU Wan-Jin , NING Fei-Peng , SUN Li-Jun , SUN Xi-Lei , WANG Xiao-Dong , XUE Zhen , YU Bo-Xiang , ZHANG Ai-Wu , ZHOU Li , , . Monte Carlo study on the low momentum μ-π identification of the BESⅢ EM calorimeter. Chinese Physics C, 2009, 33(10): 880-886. doi: 10.1088/1674-1137/33/10/011
[10]	SUN Sheng-Sen , SHEN Xiao-Yan , ZHENG Zhi-Peng , YAN Mu-Lin . Monte Carlo Study of K^*(892) Mass Splitting at BEPCⅡ/BESⅢ. Chinese Physics C, 2004, 28(5): 463-468.
[11]	ZHU Ying-Chun , SHEN Xiao-Yan , ZHENG Zhi-Peng . Monte Carlo Simulation of Searching for Glueball on BEPCⅡ/BESⅢ. Chinese Physics C, 2003, 27(7): 559-563.
[12]	CHEN Dong-Liang , LI Jin , MAO Ze-Pu , QIU Jin-Fa , Wong T . Monte Carlo Study on the Effect of Shielding in TEXONO Neutrino Experiment. Chinese Physics C, 2002, 26(6): 626-631.
[13]	LI Cheng-Bo , YUAN Jian , LIN Er-Kang , ZHANG Pei-Hua , MENG Qiu-Ying . Monte-Carlo Simulation and Analysis of the Spectrum of p+¹¹B Three-Body Sequential Decay. Chinese Physics C, 2002, 26(12): 1223-1227.
[14]	WEN Wan-Xin , JIN Gen-Ming . Monte Carlo Simulations for Optimum Design of Composite Detectors for High Energy γ Ray. Chinese Physics C, 2002, 26(12): 1291-1296.
[15]	QU Ruo-Fei , HE Hui-Hai , ZHU Qing-Qi , CHA Min , LU Hong , JING Cai-Liu , WANG Huan-Yu . Monte Carlo Simulation of 50m² RPC Carpet at Yang Ba Jing. Chinese Physics C, 2001, 25(5): 371-376.
[16]	Li Jin , Li Yushan , Qi Nading , Xue Shengtian , Wang Ping , Hu Tao , Ma Donghong , Zhang Jiawen , Zhu Qiming , Jiang Chunhua , Jiang Zhijin . Monte Carlo Study on the Strategy of Tau Mass Measurement. Chinese Physics C, 1995, 19(S2): 115-123.
[17]	BAI ZHANWU , CAO ZHEN , DING LINKAI , FENG ZHENYONG , HUANG QING , HUO ANXIANG , JIA HUANYU , JIANG GUANGZUO , JIAO SHANQING , . The Monte Carlo Simulation for the Performance of the Yangbajing EAS Array,Tibet. Chinese Physics C, 1993, 17(5): 385-390.
[18]	ZHU Zheng-Kun , ZHANG Xiao-Ze , JIN Xing-Nan , SA Ben-Hao . IMPROVEMENT OF THERMODYNAMICAL MONTE CARLO SIMULATION IN SU(2) PURE GAUGE FIELD THEORY ——AN APPROACH TO CONTINUUM PHYSICS LIMIT. Chinese Physics C, 1989, 13(4): 339-345.
[19]	Ding Linkai , Chi Xinyu , Zhu Qingqi , Jing Caiiiu , Jing Guiru . A Monte-Carlo Generator of Chou-Yang Geometrical Model. Chinese Physics C, 1988, 12(S4): 329-336.
[20]	CHEN Tian-Lun , HUANG Wu-Qun . MONTE CARLO STUDY OF THE TRIANGLE LATTICE QUENCHED EGUCHI-KAWAI MODEL. Chinese Physics C, 1986, 10(2): 254-256.

Access

Get Citation

SONG Ying-Hui, ZHANG Yu-Lin, WEI Qiang and KONG Xiang-Dong. Monte Carlo Simulation of High-energy Electron Beam Exposure in Resist[J]. Chinese Physics C, 2005, 29(12): 1219-1224.

SONG Ying-Hui, ZHANG Yu-Lin, WEI Qiang and KONG Xiang-Dong. Monte Carlo Simulation of High-energy Electron Beam Exposure in Resist[J]. Chinese Physics C, 2005, 29(12): 1219-1224. shu

RIS(for EndNote,Reference Manager,ProCite)

BibTex

Txt

Milestone

Received: 2005-01-04
Revised: 1900-01-01

Article Metric

Article Views(3230)
PDF Downloads(738)
Cited by(0)

Policy on re-use

To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.

通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

Monte Carlo Simulation of High-energy Electron Beam Exposure in Resist

Corresponding author: SONG Ying-Hui,

Institute of Electron Beam,Shandong University,Ji'nan 250061,China

Received Date: 2005-01-04

Accepted Date: 1900-01-01

Available Online: 2005-12-05

Abstract: The complex scattering process of the high-energy(50keV≤E₀≤100keV) electron beams with the Gaussian distribution in resist is simulated by Monte Carlo method with different energy range models. The backscatter coefficient of electrons and energy deposition distributions are presented under different exposure conditions. The simulation results are in good agreement with the experimental data. It is found that, in the energy range 50keV≤E₀≤100keV, higher electron beam energy, thinner resist and lower substrate's atom number will cause lower proximity effect, which agrees with the corresponding experiment. The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.

HTML

Reference (1)

Monte Carlo Simulation of High-energy Electron Beam Exposure in Resist

Abstract：

References

Access

Article Metrics

Metrics

通讯作者: 陈斌, bchen63@163.com

Email This Article