Grazing Exit X-Ray Fluorescence Spectroscopy

XU Qing; WEI Xiang-Jun; HUANG Yu-Ying; HE Wei

Chinese Physics C> 2005, Vol. 29> Issue(S1) : 80-83

Grazing Exit X-Ray Fluorescence Spectroscopy

Institute of High Energy Physics, CAS, Beijing 100049, China2 Institute of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China

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Abstract：
In this paper, A grazing exit X-ray fluorescence spectroscopy for thin film analysis was developed by Institute of High Energy Physics, Chinese Academy of Sciences. GEXRF is a new method of instrumental analysis that not only allows determination of the film composition, but also provides information on depth distributions and densities, thickness of films. With grazing-emission X-ray fluorescence, the opposite principle of total reflection X-ray fluorescence is utilized. In this study, X-ray fluorescence (XRF) experiments have been performed for metal thin films (Ni, Ni/Ti) on silicon substrates and a mirror-polished GaAs under the grazing exit condition. The XRF intensity was measured as a function of the exit angle for nearly normal X-ray incidence. The angular dependence of the grazing exit XRF intensity showed a sharp increase at the critical angle of K_α, K_β radiation for the metal film. The applicability of the grazing exit XRF for thin-film analysis was clearly demonstrated.

References

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. Rink I, Thewissen H. Spectrochim. Acta, 1999, B54: 14272. Soo Y L, Huang S, Kao Y H et al. Appl. Phys. Lett., 2000,76(25): 7293. Huh B K, Kim J S, Shin N S et al. Spectrochim. Acta,2003, B58: 14454. Klocckenkmper R, Becker H W, Bubert H et al. Spectrochim.Acta, 2002, B57: 15935. Becker R S, Golovchenko J A, Pater J R. Phys. Rev. Lett.,1983, 50(3): 1536. de Bokx P K, Kok Chr et al. Spectrochim. Acta, 1997,B52: 8297. Noma T, Miyata H, Ino S. J. Appl. Phys., 1992, 31: L9008. Tsuji K, Delalieux F. Spectrochim. Acta, 2003, B58: 22339. Emoto T, Sato Y, Konishi Y et al. Spectrochim. Acta, 2004,B59: 129110. Monaghan M L, Nigam T, Houssa M. Thin Solid Films,2000, 359(2): 19711. Tsuji K, Injuk J, Van Grieken R. X-Ray Spectrometry: Recent Technological Advance. England: John Wiley Sons,2004. 294

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XU Qing, WEI Xiang-Jun, HUANG Yu-Ying and HE Wei. Grazing Exit X-Ray Fluorescence Spectroscopy[J]. Chinese Physics C, 2005, 29(S1): 80-83.

XU Qing, WEI Xiang-Jun, HUANG Yu-Ying and HE Wei. Grazing Exit X-Ray Fluorescence Spectroscopy[J]. Chinese Physics C, 2005, 29(S1): 80-83. shu

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Received: 2005-10-28
Revised: 1900-01-01

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沈阳化工大学材料科学与工程学院沈阳 110142

Grazing Exit X-Ray Fluorescence Spectroscopy

Corresponding author: XU Qing,

Institute of High Energy Physics, CAS, Beijing 100049, China2 Institute of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China

Received Date: 2005-10-28
Accepted Date: 1900-01-01
Available Online: 2005-01-02

Abstract: In this paper, A grazing exit X-ray fluorescence spectroscopy for thin film analysis was developed by Institute of High Energy Physics, Chinese Academy of Sciences. GEXRF is a new method of instrumental analysis that not only allows determination of the film composition, but also provides information on depth distributions and densities, thickness of films. With grazing-emission X-ray fluorescence, the opposite principle of total reflection X-ray fluorescence is utilized. In this study, X-ray fluorescence (XRF) experiments have been performed for metal thin films (Ni, Ni/Ti) on silicon substrates and a mirror-polished GaAs under the grazing exit condition. The XRF intensity was measured as a function of the exit angle for nearly normal X-ray incidence. The angular dependence of the grazing exit XRF intensity showed a sharp increase at the critical angle of K_α, K_β radiation for the metal film. The applicability of the grazing exit XRF for thin-film analysis was clearly demonstrated.